Multi-Vacuum Process Equipment
Cluster-type composite process device equipped with a vacuum transport robot.
Cluster-type composite process equipment capable of accommodating a total of six chambers, including a load lock chamber, around the center chamber. 【Features】 - Gate valves are placed between the center chamber and each chamber to prevent contamination. - Gate valves are integrated within the center chamber to save space. - The main pump is installed at the top of the chamber for high maintenance accessibility. - Equipped with a uniquely developed vacuum transport robot. - Each chamber is equipped with an independent vacuum exhaust system. - Features a sputtering film deposition unit with a film thickness distribution of ±3%. - Includes a lamp annealing unit capable of heating up to 1000°C. - Equipped with a cassette load lock chamber that can accommodate 13 φ300mm silicon wafers. For more functions and details, please download the catalog.
- Company：メープル
- Price：Other
